Page Index - NanoLabStaff/nanolab GitHub Wiki
129 page(s) in this GitHub Wiki:
- Home
- NTNU NanoLab Process Wiki
- Protocols
- 950K PMMA A4.5 Spin curve for custom resist
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- Alumina mask
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- AMONIL
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- AMONIL 180nm
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- AMONIL residual layer etch
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- AMONIL resist strip
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- AR PC 5040 Protective coating for KOH etching
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- AZ5214E
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- AZ5214E lift off with MLA
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- CAIBE etch of AMONIL
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- Characterization of Graphene by Raman spectroscopy
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- Contributing
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- CSAR AR 6200 13 Anisole (0.15um)
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- CSAR AR 6200 13 Anisole (0.15um)
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- Dilution of AMONIL MMS4 to AMONIL MMS10
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- Dilution of SU 8 2000 series
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- Etching Si with 30 wt% KOH
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- Graphene transfer from Cu substrate
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- Growth of vertically aligned Carbon Nanotubes
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- Image reversal
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- Inclined Photolithography of SU 8 (45 µm)
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- MA 6
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- ma N 1400
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- ma N 2400
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- ma N 2405 ~0.5um
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- ma N 440
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- ma P 1275
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- ma P 1275 28um
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- Making gold nano particles on carbon substrates by sputtering
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- MJB3
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- PDMS
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- PDMS plasma bonding
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- Photomask Fabrication
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- PMMA
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- PMMA 100nm
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- PMMA 40 nm feature size 200 nm pitch
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- PMMA lift off 50 60 nm feature size, 110 nm pitch
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- Preparing 30 wt% KOH
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- Replica molding
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- S1813
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- S1813 1p4um
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- S1818
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- S1818 1p9um
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- SF6 plasma isotropic etch for Si
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- Si cryogenic etch
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- Si cryogenic etch 70 nm holes
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- Si cryogenic etch Sub 60 nm features with PMMA mask
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- Simple lift off using ma N 440
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- SPR700
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- SPR700 1um
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- Sputtering of Si for SiO2 films
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- Standard Procedure for CSAR62 on Si with BEAMER PEC
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- SU 8
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- SU 8 100um
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- SU 8 13um
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- SU 8 2
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- SU 8 2100
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- SU 8 2um
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- SU 8 5
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- SU 8 50um
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- SU 8 5um
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- SU 8 EBL
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- TEM specimen preparation in FIB
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