PMMA 40 nm feature size 200 nm pitch - NanoLabStaff/nanolab GitHub Wiki

by Bjørn A. Strøm ([email protected])

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1. Spin coat PMMA (96 nm/208 nm)

    PMMA A4 (208 nm)
    4000 rpm for 47 s
    Ramp: 2000 rpm/s 
   
    PMMA A2 (96 nm)
    2000 rpm for 50 s
    Ramp: 500 rpm/s 
   

2. Soft bake

    180 °C for 60 s 
   

3. Exposure

    Features: dots
    HV: 30 kV
    Current: 40 pA
    Dose: 9 fC
    Settling time: 0.1 ms
   

4. Develop

    3:7 Water:IPA for ~ 2 min (7 °C)
    Dry with N2(g)
   

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Process writing time with 100 um write field: 2 hours and 10 minutes per square mm.

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