AZ5214E - NanoLabStaff/nanolab GitHub Wiki
A positive resist that can change polarity, also known as image reversal. Image reversal can create severe undercut profiles making it ideal for lift-off purposes.
Coater: Polos Spin 150
| Spin speed (rpm) | Thickness (μm) |
|---|---|
| 2000 | 1.98 |
| 3000 | 1.62 |
| 4000 | 1.40 |
| 5000 | 1.25 |
| 6000 | 1.14 |
AZ5214E profiles for different IR bake temperatures. All samples exposed with 8mJ and developed in MIF726 for 60s.
AZ5214E profiles for 112°C (top) and 110°C (bottom) IR bakes at different exposure doses. All samples developed in MIF726 for 60s.
AZ5214E profiles after different development times in MIF726 developer
50s at 110°C is recommended in the data sheet, but I have seen no difference between this and the lower temperature soft bake (95°C for 60s).