Image reversal - NanoLabStaff/nanolab GitHub Wiki

~1.4μm AZ5214E Image Reversal Process

by Jonas M. Ribe

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1. Spin coat AZ5214E

    4000rpm for 45s
    Ramp: 4000rpm/s for 1s
   

2. Soft bake

    95°C for 60s
   

3. Exposure (MA-6)

    15mJ/cm²
   

4. Image-reversal bake

    112°C for 120s (low profile hot plate)
   

5. Flood exposure

    200mJ
   

6. Develop

    AZ726 MIF ~60s (gently stirring)
    Rinse in DI
    Dry with N2(g)
   

7. Optional: Hard bake

    120°C for 50s
   

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This process is trying to strike a balance between a pronounced undercut and stable structures down to a couple microns. If you want more or less pronounced undercuts use the data shown in AZ5214E to determine what parameters to change. In general though the exposure is the easiest to tweak.