CAIBE etch of AMONIL - NanoLabStaff/nanolab GitHub Wiki

by Vilde Sørdal ([email protected])

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1. Sample mounting

    Apply a thin layer of Fomblin oil on a 4" Si carrier wafer. Place your sample on top and fasten it securely with Kapton tape.
   

2. Etching recipe

    Ar flow, neutralizer: 5 sccm
    Ar flow: 15 sccm
    Neutralizer current: 400 mA
    Beam current: 300 mA
    Beam voltage: 300 V
    Accelerator voltage: 200 V
    Substrate angle: 0°
    Rotation: 20 rpm
    Platen temperature: 20 °C
    Chamber temperature: 40 °C
    He backing: 20 Torr
    Etch rate AMONIL: 5,5 nm/min
   

3. Removal of AMONIL

    Remove AMONIL in a piranha solution for about 30 minutes.
   

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