ma N 2405 ~0.5um - NanoLabStaff/nanolab GitHub Wiki

by Erik Palesch ([email protected])


  1. Spin coat ma-N 2405 (0.5 μm)

     3000 RPM for 33 s
     Ramp: 1000 RPM/s for 3 s  
    
  2. Soft bake

     90 °C for 90 s 
    
  3. Exposure

     Features: Areas
     HV: 100 kV
     Current: 500 pA
     Dose: 700 μC/cm^2
    
  4. Post-exposure bake

     None.
    
  5. Develop

     ma-D 525 for ~ 60 s (gently agitating from side to side in two orthogonal directions)
     Rinse in DI water for 30 s
     Dry with N2(g)
    

This process was done on STS Elionix EBL system. It should work for areas from 100 nm to 1 um in dimension. Use the Beamer SW or another one with PEC to obtain good results when working with many objects close to each other. Very clean sample required, o-zone cleaning should follow after solvent cleaning. Use at least 600 ul for spin-coating of 2 inch wafer. Clean the backside of the wafer with swab soaked in suitable solvent if there is remaining resist.