ma N 2405 ~0.5um - NanoLabStaff/nanolab GitHub Wiki
by Erik Palesch ([email protected])
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Spin coat ma-N 2405 (0.5 μm)
3000 RPM for 33 s Ramp: 1000 RPM/s for 3 s
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Soft bake
90 °C for 90 s
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Exposure
Features: Areas HV: 100 kV Current: 500 pA Dose: 700 μC/cm^2
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Post-exposure bake
None.
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Develop
ma-D 525 for ~ 60 s (gently agitating from side to side in two orthogonal directions) Rinse in DI water for 30 s Dry with N2(g)
This process was done on STS Elionix EBL system. It should work for areas from 100 nm to 1 um in dimension. Use the Beamer SW or another one with PEC to obtain good results when working with many objects close to each other. Very clean sample required, o-zone cleaning should follow after solvent cleaning. Use at least 600 ul for spin-coating of 2 inch wafer. Clean the backside of the wafer with swab soaked in suitable solvent if there is remaining resist.