Simple lift off using ma N 440 - NanoLabStaff/nanolab GitHub Wiki

by Jonas M. Ribe ([email protected])

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1. Spin coat ma-N 440 (4.20μm)

    3000rpm for 30s
    Ramp: 3000rpm/s for 1s  
   

2. Soft bake

    95°C for 5min 
   

3. Exposure MA-6

    1300mJ/cm²
   

4. Develop

    Ma-D 332s for ~3min (gently stirring)
    Rinse in DI for >30s
    Dry with N2(g)
   

5. Deposit metal

6. Acetone lift-off

    Rinse in acetone until resist with metal layer clears.
    Rinse in IPA.
    Dry with N2.
   

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This is a simple lift-off process for when you don't need high resolution patterns. There should be no need for using an ultrasonic bath or elevated temperatures to clear the resist using acetone.