Simple lift off using ma N 440 - NanoLabStaff/nanolab GitHub Wiki

by Jonas M. Ribe ([email protected])

  1. Spin coat ma-N 440 (4.20μm)

     3000rpm for 30s
 Ramp: 3000rpm/s for 1s

  2. Soft bake

     95°C for 5min

  3. Exposure MA-6

     1300mJ/cm²

  4. Develop

     Ma-D 332s for ~3min (gently stirring)
 Rinse in DI for >30s
 Dry with N2(g)

  5. Deposit metal

  6. Acetone lift-off

     Rinse in acetone until resist with metal layer clears.
 Rinse in IPA.
 Dry with N2.

This is a simple lift-off process for when you don't need high resolution patterns. There should be no need for using an ultrasonic bath or elevated temperatures to clear the resist using acetone.

Discuss this protocol!