SU 8 2um - NanoLabStaff/nanolab GitHub Wiki

2μm SU-8 Process

by Jonas M. Ribe


  1. Spin coat SU-8 2

     2000rpm for 30s
     Ramp: 500rpm/s (+4s)
    
  2. Soft bake

     1min at 65°C
     2min at 95°C
    
  3. Exposure (MJB3)

     ~60mJ/cm²
    
  4. Post-exposure Bake

     1min at 65°C
     Ramp hot plate to 95°C 
     2min at 95°C
    
  5. Develop

     ~1 min in mrDev 600 (under agitation)
     Rinse in fresh developer
     Rinse in IPA
     Dry w. N2
    

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