SU 8 2um - NanoLabStaff/nanolab GitHub Wiki

2μm SU-8 Process

by Jonas M. Ribe

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1. Spin coat SU-8 2

    2000rpm for 30s
    Ramp: 500rpm/s (+4s)
   

2. Soft bake

    1min at 65°C
    2min at 95°C
   

3. Exposure (MJB3)

    ~60mJ/cm²
   

4. Post-exposure Bake

    1min at 65°C
    Ramp hot plate to 95°C 
    2min at 95°C
   

5. Develop

    ~1 min in mrDev 600 (under agitation)
    Rinse in fresh developer
    Rinse in IPA
    Dry w. N2
   

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