SU 8 2um - NanoLabStaff/nanolab GitHub Wiki
2μm SU-8 Process
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Spin coat SU-8 2
2000rpm for 30s Ramp: 500rpm/s (+4s)
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Soft bake
1min at 65°C 2min at 95°C
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Exposure (MJB3)
~60mJ/cm²
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Post-exposure Bake
1min at 65°C Ramp hot plate to 95°C 2min at 95°C
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Develop
~1 min in mrDev 600 (under agitation) Rinse in fresh developer Rinse in IPA Dry w. N2