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NTNU NanoLab Process Wiki

Welcome to the process Wiki for NTNU NanoLab! Here you will find protocols written by our own users in addition to information related to the instruments and chemicals in our cleanroom.

Disclaimer

Currently (April-2025), this repository contains only a public Nanolab Protocol Wiki. Information contained herein is considered to be for public use. Protocols and additiona information are voluntary contributions. The information may not reflect the most up-to-date methods or be fully validated. Use at your own risk. For NTNU Nanolab member users, the main source for information can be found on the LIMS website and forum within.

  • For instrument booking use LIMS.
  • Discussions are hosted on the NanoLab Forum in LIMS.

Protocols

Photolithography * Photomask Fabrication
Positive resists
Negative resists
Liftoff
Soft lithography * PDMS replica molding * PDMS plasma bonding
Electron beam lithography (EBL)
Positive resists
Negative resists
Nanoimprint lithography (NIL) * UV-curable resist * AMONIL 180nm * Dilution of AMONIL MMS4 to AMONIL MMS10
Etching
Dry etch
Wet etch
Deposition
Graphene Transfer * Graphene transfer from Cu substrate
Characterization * Raman Spectroscopy * Characterization of Graphene by Raman spectroscopy
FIB * TEM specimen preparation in FIB
⚠️ **GitHub.com Fallback** ⚠️