SU 8 100um - NanoLabStaff/nanolab GitHub Wiki

100μm SU-8 Process

by Patricia Moura ([email protected])


  1. Spin coat SU-8 2100 (100 μm)

     Init: 500 rpm for 10 sec with acceleration of 100 rpm/sec
     Final: 3000 rpm for 30 sec with acceleration of 300 rpm/sec.
    
  2. Soft bake

     5 min at 65ºC
     (25-30)min at 95ºC
     Cool down at room temperature (minimum 10 min).
    
  3. Exposure

     ~240 mJ/cm² (measured using Karl Suss model 1000 Intensity)
    Note: An exposure matrix experiment should be performed to determine the optimum dosage.
    
  4. Post-exposure bake

     5 min at 65ºC
     Ramp hot plate to 95ºC
     10 min at 95ºC
     Turn off hot-plate and leave sample until it has reached room temperature (~40 min)
     (Rapid cooling should be avoided).
    
  5. Develop

     mrDev 600 for ~(5-8) min (gently stirring)
     Rinse in fresh developer
     Rinse in IPA
     Dry with N2(g)
    
  6. Optional: Hard bake


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