SU 8 100um - NanoLabStaff/nanolab GitHub Wiki

100μm SU-8 Process

by Patricia Moura ([email protected])

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1. Spin coat SU-8 2100 (100 μm)

    Init: 500 rpm for 10 sec with acceleration of 100 rpm/sec
    Final: 3000 rpm for 30 sec with acceleration of 300 rpm/sec.
   

2. Soft bake

    5 min at 65ºC
    (25-30)min at 95ºC
    Cool down at room temperature (minimum 10 min).
   

3. Exposure

    ~240 mJ/cm² (measured using Karl Suss model 1000 Intensity)
   Note: An exposure matrix experiment should be performed to determine the optimum dosage.
   

4. Post-exposure bake

    5 min at 65ºC
    Ramp hot plate to 95ºC
    10 min at 95ºC
    Turn off hot-plate and leave sample until it has reached room temperature (~40 min)
    (Rapid cooling should be avoided).
   

5. Develop

    mrDev 600 for ~(5-8) min (gently stirring)
    Rinse in fresh developer
    Rinse in IPA
    Dry with N2(g)
   

6. Optional: Hard bake

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