SU 8 100um - NanoLabStaff/nanolab GitHub Wiki
SU-8 Process
100μmby Patricia Moura ([email protected])
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Spin coat SU-8 2100 (100 μm)
Init: 500 rpm for 10 sec with acceleration of 100 rpm/sec Final: 3000 rpm for 30 sec with acceleration of 300 rpm/sec.
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Soft bake
5 min at 65ºC (25-30)min at 95ºC Cool down at room temperature (minimum 10 min).
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Exposure
~240 mJ/cm² (measured using Karl Suss model 1000 Intensity) Note: An exposure matrix experiment should be performed to determine the optimum dosage.
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Post-exposure bake
5 min at 65ºC Ramp hot plate to 95ºC 10 min at 95ºC Turn off hot-plate and leave sample until it has reached room temperature (~40 min) (Rapid cooling should be avoided).
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Develop
mrDev 600 for ~(5-8) min (gently stirring) Rinse in fresh developer Rinse in IPA Dry with N2(g)
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Optional: Hard bake