PMMA 100nm - NanoLabStaff/nanolab GitHub Wiki

by Jonas M. Ribe

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1. Spin coat PMMA A2

    Step1:  500RPM for 10s 
    Step2: 2000RPM for 45s 
    Ramp 500RPM/s (+4s)
   

2. Soft bake

    180°C for 90s
   

3. Exposure (EBL)

    Features: Area
    HV: 10kV
    Current: ~0.2nA
    Dose: ~100μC/cm^2
   

4. Develop

    MIBK:IPA 1:3 for 1-2min (gently stirring)
    Rinse for 30s in DI water
    Dry w. N2 (g)
   

5. Hard bake

    100°C for 90s
   

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