ma P 1275 28um - NanoLabStaff/nanolab GitHub Wiki

by Nimi Gopalakrishnan

1. Spin coat first ma-P 1275 layer (14μm)

    2000rpm for 30s/ 500rpm/s
    spread: 500rpm for 10s at 100rpm/s
   

2. Soft bake first layer

    92°C for 2min (right hot plate)
   

3. Spin coat second ma-P 1275 layer (14μm)

    2000rpm for 30s/ 500rpm/s
   

4. Soft bake second layer

    92°C for 2min
   

5. Edge bead removal

    1000rpm/s 40s 3000rpm use ethanol
   

6. Soft bake

    92°C for 2min
   

7. Exposure MA-6

    1200mJ/cm² multi expo, cycle 2
   

8. Develop

    ma-D 531 for 25min (gently stirring)
    Rinse in DI for >30s
    Dry with N2(g)
   

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